Application of deep reactive ion etching for silicon angular rate sensor
- 1 March 1995
- journal article
- research article
- Published by Springer Nature in Microsystem Technologies
- Vol. 2 (1), 186-190
- https://doi.org/10.1007/bf02739557
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- A micromachined vibrating gyroscopePublished by Institute of Electrical and Electronics Engineers (IEEE) ,2005
- A micromachined comb-drive tuning fork rate gyroscopePublished by Institute of Electrical and Electronics Engineers (IEEE) ,2002
- Fine frequency tuning in resonant sensorsPublished by Institute of Electrical and Electronics Engineers (IEEE) ,2002
- High-rate directional deep dry etching for bulk silicon micromachiningJournal of Micromechanics and Microengineering, 1995