High rate deposition of VCTiC alloy carbides by activated reactive evaporation
- 1 September 1977
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 45 (3), 447-452
- https://doi.org/10.1016/0040-6090(77)90231-0
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
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- The Effect of Substrate Temperature on the Structure of Titanium Carbide Deposited by Activated Reactive EvaporationJournal of Vacuum Science and Technology, 1972
- Activated Reactive Evaporation Process for High Rate Deposition of CompoundsJournal of Vacuum Science and Technology, 1972
- Microstructure and mechanical behavior of carbidesMaterials Science and Engineering, 1968
- Gewinnung von mischkarbiden aus dem hilfsmetallbadJournal of the Less Common Metals, 1968