A Simple Flying Spot Scanner Design for Electron Lithography

Abstract

A simple, inexpensive flying spot scanner system is described which enables a conventional scanning electron microscope(SEM) to be used for research projects in electron beamlithography. The unit, built almost entirely from readily purchased parts, bolts onto the SEM without any modification of the microscope itself. The ultimate resolution of the system exceeds 45 line pairs/cm over a 9 cm square frame, giving over 900 beam on, beam off operations per frame. The system has been used with electron lithography to etch thin films into patterns of considerable complexity with linewidths of less than 5000 Å.