Hydrogen in oxidized silicon oxynitride thin films
- 1 September 1988
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 33-34, 765-772
- https://doi.org/10.1016/0169-4332(88)90378-9
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Oxidation behaviour of LPCVD silicon oxynitride filmsApplied Surface Science, 1988
- Hydrogen in low-pressure chemical-vapor-deposited silicon (oxy)nitride filmsJournal of Applied Physics, 1986
- Deposition and composition of silicon oxynitride filmsJournal of Vacuum Science & Technology B, 1983
- New precision technique for measuring the concentration versus depth of hydrogen in solidsApplied Physics Letters, 1976