A rheed study of the adsorption of oxygen, hydrogen, nitrogen and water vapour on the (100) face of tantalum
- 31 December 1971
- journal article
- Published by Elsevier in Surface Science
- Vol. 28 (2), 581-597
- https://doi.org/10.1016/0039-6028(71)90065-3
Abstract
No abstract availableThis publication has 10 references indexed in Scilit:
- Simultaneous LEED and RHEED studies of the growth of zirconium on the tungsten (100) surfaceSurface Science, 1971
- The surface potential of water vapour on epitaxially grown (110) oriented films of platinumSurface Science, 1969
- LEED Observations of Epitaxially Grown Thorium on (100) TantalumJournal of Applied Physics, 1968
- Contact-potential measurements of the adsorption of Cs, O2 and H2 on (110) TaSurface Science, 1967
- Leed and heed studies of the interaction of oxygen with single crystal surfaces of copperSurface Science, 1967
- Adsorption on Niobium (110), Tantalum (110), and Vanadium (110) SurfacesThe Journal of Chemical Physics, 1967
- Chemisorption of Hydrogen on Tungsten (100)The Journal of Chemical Physics, 1966
- Low-energy electron diffraction and photoelectric study of (110) tantalum as a function of ion bombardment and heat treatmentSurface Science, 1964
- Streuung von 25 keV-Elektronen an GasenThe European Physical Journal A, 1964
- Adsorption of Water on TungstenNature, 1957