In Situ Atomic Force Microscopy Observation of Change in Thickness of Nickel Hydroxide Layer on Ni Electrode
- 1 January 1996
- journal article
- research article
- Published by American Chemical Society (ACS) in Langmuir
- Vol. 12 (10), 2332-2333
- https://doi.org/10.1021/la9515229
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
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- Nanoscale thickness changes of nickel hydroxide films during electrochemical oxidation/reduction monitored by in situ atomic force microscopyJournal of Electroanalytical Chemistry, 1995
- In situ Atomic Force Microscopy Imaging of Electroprecipitated Nickel Hydrous Oxide Films in Alkaline ElectrolytesLangmuir, 1994
- Zur kenntnis der nickelhydroxidelektrode—I.Über das nickel (II)-hydroxidhydratElectrochimica Acta, 1966