New oxide growth law and the thermal oxidation of silicon
- 15 May 1983
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 42 (10), 872-874
- https://doi.org/10.1063/1.93797
Abstract
A general kinetic law governing the thermal growth of oxide films is presented. It encompasses the Deal–Grove linear-parabolic growth law and Blanc’s growth law as two special cases; it extends to more general cases where the interface reaction rate has a power-law dependence on oxidant pressure, such as observed in the thermal oxidation of silicon, where neither the Deal–Grove nor the Blanc growth law is applicable. The new growth law is required even for oxidation under atmospheric pressure because of the varying oxidant pressure at the Si–SiO2 interface. Probable mechanisms for silicon oxidation are suggested.Keywords
This publication has 14 references indexed in Scilit:
- High Pressure Oxidation of Silicon in Dry OxygenJournal of the Electrochemical Society, 1982
- Silicon Oxidation Studies: Measurement of the Diffusion of Oxidant in SiO2 FilmsJournal of the Electrochemical Society, 1982
- The Growth and Characterization of Very Thin Silicon Dioxide FilmsJournal of the Electrochemical Society, 1980
- Thermal oxidation of silicon in various oxygen partial pressures diluted by nitrogenJournal of Applied Physics, 1977
- Thermal Oxidation of Silicon: In Situ Measurement of the Growth Rate Using EllipsometryJournal of the Electrochemical Society, 1975
- Kinetics of Thermal Growth of Ultra-Thin Layers of SiO[sub 2] on SiliconJournal of the Electrochemical Society, 1972
- Thin Tunnelable Layers of Silicon Dioxide Formed by Oxidation of SiliconJournal of the Electrochemical Society, 1970
- Separation of the Linear and Parabolic Terms in the Steam Oxidation of SiliconIBM Journal of Research and Development, 1966
- General Relationship for the Thermal Oxidation of SiliconJournal of Applied Physics, 1965
- On the Rates of Oxidation of Silicon and of Silicon Carbide in Oxygen, and Correlation with Permeability of Silica Glass.Acta Chemica Scandinavica, 1964