Preparation of SiO2 overlayers on oxide substrates by chemical vapor deposition of Si(OC2H5)4
- 1 October 1987
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 29 (2), 223-241
- https://doi.org/10.1016/0169-4332(87)90005-5
Abstract
No abstract availableKeywords
This publication has 25 references indexed in Scilit:
- Fine control of the pore-opening size of zeolite ZSM-5 by chemical vapor deposition of silicon methoxideThe Journal of Physical Chemistry, 1986
- Photooxidation of methanol using vanadium pentoxide/titanium dioxide and molybdenum trioxide/titanium dioxide surface oxide monolayer catalystsThe Journal of Physical Chemistry, 1986
- PREPARATION OF AMORPHOUS TiO2 FILMS BY THERMOPHORESIS-AIDED CHEMICAL VAPOR DEPOSITIONChemistry Letters, 1986
- The Electrical and Structural Features of Vanadium-oxide Films as Formed by the Thermal Decomposition of Vanadium NaphthenateBulletin of the Chemical Society of Japan, 1984
- Spillover of deuterium on platinum/titanium dioxide. 1. Dependence on temperature, pressure, and exposureThe Journal of Physical Chemistry, 1984
- Infrared study of the surface of titanium dioxides. II. Acidic and basic propertiesThe Journal of Physical Chemistry, 1971
- Infrared study of the surface of titanium dioxides. I. Hydroxyl groupsThe Journal of Physical Chemistry, 1971
- Mechanism of gaseous siloxane reaction with silica. IIThe Journal of Physical Chemistry, 1968
- Mechanism of gaseous siloxane reaction with silica. IThe Journal of Physical Chemistry, 1968
- Ethanol dehydration on alumina catalysts I. The thermal desorption of surface compoundsJournal of Catalysis, 1967