High reflectivity fibre gratings produced by incubated damage using a 193 nm ArF laser
- 1 January 1994
- journal article
- Published by Institution of Engineering and Technology (IET) in Electronics Letters
- Vol. 30 (11), 860-862
- https://doi.org/10.1049/el:19940580
Abstract
High reflectivity gratings have been formed in optical fibre using a 193 nm ArF laser irradiated phase mask. Relatively high absorption in the fibre core at this wavelength coupled with an incubation effect in which the absorption grows with repeated exposure allows rapid grating formation (~10 pulses) at modest fluences (~400 m Jcm-2).This publication has 7 references indexed in Scilit:
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