An investigation of the impact of technology scaling on power wasted as short-circuit current in low voltage static CMOS circuits
- 24 December 2002
- conference paper
- Published by Institute of Electrical and Electronics Engineers (IEEE)
- p. 145-150
- https://doi.org/10.1109/lpe.1996.547497
Abstract
In this paper the effects of technology scaling on the fraction of active power P/sub a/ wasted as short-circuit power P/sub s/ are studied through SPICE simulations. The accuracy of SPICE is verified against experimental data. SPICE simulations show that lowering V/sub T/ below 0.1 V can increase P/sub s//P/sub a/ significantly beyond what is expected from increased subthreshold leakage. P/sub s//P/sub a/ is typically higher at higher V/sub cc/ but to first order P/sub s//P/sub a/ is determined by signal slew rates and V/sub T/. It is shown that the input slew rate is constrained by P/sub s//P/sub a/ at low V/sub T/ and by performance at higher V/sub T/. We show that P/sub s/ increases with increasing gate sheet resistance. A simple analytical model for this effect is verified against the experimental data and used to determine the gate sheet requirements to maintain Ps/Pa<10% for sub-0.25 /spl mu/m technologies.Keywords
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