Diffusion of Ion‐Implanted Arsenic in Thermally Grown SiO2 Films

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1 November 1984

journal article
Published by The Electrochemical Society in Journal of the Electrochemical Society

Vol. 131 (11), 2645-2651
https://doi.org/10.1149/1.2115376

Abstract

No abstract available

Cited by 24 articles