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Analysis of Hydrogen Content in Plasma Silicon Nitride Film
Home
Publications
Analysis of Hydrogen Content in Plasma Silicon Nitride Film
Analysis of Hydrogen Content in Plasma Silicon Nitride Film
TY
Takeo Yoshimi
Takeo Yoshimi
HS
Hideo Sakai
Hideo Sakai
KT
Keizo Tanaka
Keizo Tanaka
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1 August 1980
journal article
Published by
The Electrochemical Society
in
Journal of the Electrochemical Society
Vol. 127
(8)
,
1853-1854
https://doi.org/10.1149/1.2130015
Abstract
No abstract available
Cited by 16 articles