Apparatus for the controlled deposition of optical film systems
- 30 September 1959
- Vol. 9 (3-4), 171-185
- https://doi.org/10.1016/0042-207x(59)90189-7
Abstract
No abstract availableThis publication has 17 references indexed in Scilit:
- Ionic Bombardment Cleaning of GlassNature, 1958
- A New Apparatus for Cathodic SputteringNature, 1956
- Filmed Surfaces for Reflecting Optics*Journal of the Optical Society of America, 1955
- Improved Methods for Producing Interference FiltersOptica Acta: International Journal of Optics, 1955
- The distribution of thin films condensed on surfaces by the vacuum evaporation methodVacuum, 1952
- preparation, properties and optical applications of thin films of titanium dioxideVacuum, 1952
- The Fundamental Limit of Sensitivity of PhotometersReview of Scientific Instruments, 1952
- Contribution à l'étude de l'intensité des raies et bandes d'absorption dans l'infrarougeJournal de Physique et le Radium, 1952
- A Method for Production of Interference Filters for Specified Wave-LengthsNature, 1951
- The construction of interference filters for the transmission of specified wavelengthsJournal de Physique et le Radium, 1950