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An Etching Mechanism of Ta by Chlorine‐Based Plasmas
Home
Publications
An Etching Mechanism of Ta by Chlorine‐Based Plasmas
An Etching Mechanism of Ta by Chlorine‐Based Plasmas
MY
Masao Yamada
Masao Yamada
MN
Masafumi Nakaishi
Masafumi Nakaishi
KS
Kenji Sugishima
Kenji Sugishima
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1 February 1991
journal article
Published by
The Electrochemical Society
in
Journal of the Electrochemical Society
Vol. 138
(2)
,
496-499
https://doi.org/10.1149/1.2085617
Abstract
No abstract available
Cited by 11 articles