Amorphous SiOx:H alloy films as wide optical-gap materials
- 1 December 1989
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 115 (1-3), 126-128
- https://doi.org/10.1016/0022-3093(89)90382-7
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- a-Si1-xOx:H Films Prepared by Direct Photo-CVD Using CO2 GasJapanese Journal of Applied Physics, 1988
- Structure and Defects in Amorphous Si–O FilmsJapanese Journal of Applied Physics, 1987
- Wide Optical-Gap a-Si:O:H Films Prepared from SiH4–CO2 Gas MixtureJapanese Journal of Applied Physics, 1986
- Wide Optical-Gap, Photoconductive a-SixN1-x:HJapanese Journal of Applied Physics, 1981
- Electrical and optical properties of amorphous silicon carbide, silicon nitride and germanium carbide prepared by the glow discharge techniquePhilosophical Magazine, 1977