Analysis of stress and strain distribution in thin films and substrates
- 1 July 1976
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 47 (7), 3224-3229
- https://doi.org/10.1063/1.323119
Abstract
Calculations are presented for the distribution of stress and strain in thin films and substrates from inhomogeneous plane stresses developed in the film during deposition. The results can be applied to the ’’bending‐plate method’’ of determining the unknown stresses in a film, in which the deformation of the substrate surface is measured. Thereby the local values of the stress tensor within the film plane (averaged through the film thickness) and the center of the stress distribution normal to the film plane can be obtained in principle. A more convenient evaluation based on linear approximations is applicable when the film thickness is small. Restrictions are discussed which result from neglecting the conditions of compatibility for the components of the strain tensor.Keywords
This publication has 3 references indexed in Scilit:
- Recent developments in the study of mechanical properties of thin filmsThin Solid Films, 1972
- Mechanisms of Stress Relief in Polycrystalline FilmsIBM Journal of Research and Development, 1969
- Determination of Stress in Films on Single Crystalline Silicon SubstratesReview of Scientific Instruments, 1965