Noninteger InAs monolayer well InAs/GaAs single quantum well structures grown by metalorganic chemical vapor deposition
- 8 August 1988
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 53 (6), 495-496
- https://doi.org/10.1063/1.99879
Abstract
InAs/GaAs single quantum well structures have been grown by metalorganic chemical vapor deposition. The grown wells are 1.03, 1.3, and 1.7 InAs monolayers thick. The 4 K photoluminescence spectra exhibit strong and narrow peaks, their energy decreasing smoothly with increasing well thickness. The noninteger value is interpreted on the model that the interface is macroscopically flat but has valleys and hills with their lateral extent smaller than excitons. The effective interface position is determined by their relative lateral extent.Keywords
This publication has 3 references indexed in Scilit:
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- Ultrathin InAs/GaAs single quantum well structures grown by atomic layer epitaxyApplied Physics Letters, 1986
- Ultrathin GaAs/GaAlAs layers grown by MOCVD and their structural characterizationSurface Science, 1986