Reduction of photoresist standing-wave effects by post-exposure bake

Publisher Website

1 July 1975

journal article
Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Electron Devices

Vol. 22 (7), 464-466
https://doi.org/10.1109/T-ED.1975.18162

Abstract

A process is described for reducing the residual effects of standing waves upon exposed and developed lines in positive photoresist films.

Keywords

Cited by 41 articles