Rankings
Publications
Search Publications
Cited-By Search
Sources
Publishers
Scholars
Scholars
Top Cited Scholars
Organizations
About
Login
Register
Home
Publications
A novel electron-beam exposure technique for 0.1-μm T-shaped gate fabrication
Home
Publications
A novel electron-beam exposure technique for 0.1-μm T-shaped gate fabrication
A novel electron-beam exposure technique for 0.1-μm T-shaped gate fabrication
NS
N. Samoto
N. Samoto
YM
Y. Makino
Y. Makino
KO
K. Onda
K. Onda
EM
E. Mizuki
E. Mizuki
TI
T. Itoh
T. Itoh
Publisher Website
Google Scholar
Add to library
Cite
Download
Share
Download
1 November 1990
journal article
Published by
American Vacuum Society
in
Journal of Vacuum Science & Technology B
Vol. 8
(6)
,
1335-1338
https://doi.org/10.1116/1.584914
Abstract
No abstract available
Keywords
ELECTRON BEAM
Cited by 31 articles