Production of submicronstructures in highly conductive substrates

Abstract

The optical projection technique on highly reflective substrates has been considered in order to realize patterns far into the submicron range. The image formation utilizing high numerical lenses has been theoretically treated. In the section on theory full account has been given of the vectorial character of the electromagnetic radiation. Conclusions have been drawn regarding the image in the resist and about the pattern which is formed in the metal if chemical or sputter etching is applied. It is shown theoretically as well as experimentally that the problems arising in conjunction with the standing waves can be solved by applying anti-reflecting coatings consisting of amorphous silicon and selenium