Analysis of reflection high-energy electron-diffraction data from reconstructed semiconductor surfaces
- 15 January 1984
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 29 (2), 814-819
- https://doi.org/10.1103/physrevb.29.814
Abstract
Features in reflection high-energy electron-diffraction patterns arising from various types of surface disorder are discussed, with specific examples of each. The relationship between (001)2×4 and reconstructions, which are frequently observed on III-V compound semiconductor surfaces, is explicitly demonstrated.
Keywords
This publication has 17 references indexed in Scilit:
- Angle-resolved photoemission studies of GaAs(100) surfaces grown by molecular-beam epitaxyPhysical Review B, 1983
- New method for the analysis of reflection high-energy electron diffraction:and InSb(001) surfacesPhysical Review B, 1983
- Surface electronic structure of GaAs(001)-(2×4): Angle-resolved photoemission and tight-binding calculationsPhysical Review B, 1982
- Rheed evidence for a domain structure of GaAs(001)−2 × 4 AND −4 × 2 reconstructed surfacesSurface Science, 1982
- Development of steps on GaAs during molecular beam epitaxyJournal of Vacuum Science and Technology, 1982
- Diffuse scattering in RHEED induced by linear disorders of sulphur segregated on nickel (111) surfaceSurface Science, 1980
- Composition and structure of differently prepared GaAs(100) surfaces studied by LEED and AESSurface Science, 1978
- The origins of streaked intensity distributions in reflection high energy electron diffractionJournal of Physics C: Solid State Physics, 1978
- Comparative LEED and RHEED examination of stepped surfaces; Application to Cu(111) and GaAs(100) vicinal surfacesSurface Science, 1977
- Leed and heed studies of the interaction of oxygen with single crystal surfaces of copperSurface Science, 1967