Plasma etching of ZnS, ZnSe, CdS, and CdTe in electron cyclotron resonance CH4/H2/Ar and H2/Ar discharges
- 1 January 1993
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 11 (1), 15-19
- https://doi.org/10.1116/1.586718