Recoil implantation of oxygen from SiO2 thin films on silicon
- 1 May 1981
- journal article
- Published by Elsevier in Nuclear Instruments and Methods
- Vol. 182-183, 137-141
- https://doi.org/10.1016/0029-554x(81)90681-9
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
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- Recoil implantation from thin surface films on siliconRadiation Effects, 1978
- Residual defects in Si produced by recoil implantation of oxygenApplied Physics Letters, 1975
- Bistability behavior of texture in cholesteric liquid crystals in an electric fieldApplied Physics Letters, 1974
- Anomalous residual damage in Si after annealing of ``through-oxide'' arsenic implantationsApplied Physics Letters, 1973
- Nuclear reaction analysis of boron and oxygen in siliconJournal of Radioanalytical and Nuclear Chemistry, 1972