SPUTTERING DUE TO NEGATIVE OXYGEN IONS IN OXYGEN DISCHARGES

Abstract

The effect of gaseous negative oxygen ion impact on an anode surface is examined. Gold films (≈300 Å) are sputtered at a pressure of 30–35 mtorr and at several anode voltages and currents. Results show a linear dependency of the sputtering rate on the applied anode voltage up to 95 V, while at higher voltages there is little change in the sputtering rate. The sputtering yield shows a decreasing nonlinear dependence on the applied anode voltage. The latter is explained in terms of the decrease in the electronegative character of the discharge.