Possibilities and limitations of the stylus method for thin film thickness measurements
- 1 April 1974
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 21 (2), 237-243
- https://doi.org/10.1016/0040-6090(74)90110-2
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Effect of Oxygen on the Electrical and Structural Properties of Triode-Sputtered Tantalum FilmsJournal of Applied Physics, 1971
- Phase composition and conductivity of sputtered tantalumThin Solid Films, 1970
- Thickness Measurements of Thin Permalloy Films: Comparison of X-Ray Emission Spectroscopy, Interferometry, and Stylus MethodsJournal of Vacuum Science and Technology, 1965