Single Crystal Growth of Titanium Carbide by Chemical Vapor Deposition

Abstract
Various forms of titanium carbide crystals were deposited on graphite substrates from the vapor phase consisting of hydrogen, titanium tetrachloride, and a hydrocarbon in the temperature range of 1200°–1350°C. The correlations between the crystal morphology and the growth conditions (temperature, gas flow‐rates, concentrations, impurities, etc.) were investigated. The decomposition of the hydrocarbon was found to play an important role on the growth process. By x‐ray diffraction, it was concluded that the growth direction of these crystals was mainly although sometimes kinked toward . The growth mechanism of the single crystal was further studied by observation of the etching figures of the cross section which showed hexagonal growth layers. Finally the tensile strength of needle or pillar crystals was measured and a linear relation (on log‐log scale only) was confirmed between the diameter and the strength.