Ion-beam-induced silicide formation in nickel thin films on silicon
- 1 June 1983
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 104 (1-2), 167-173
- https://doi.org/10.1016/0040-6090(83)90558-8
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Formation and structure of epitaxial NiSi2 and CoSi2Thin Solid Films, 1982
- Production and annealing of ion-bombardment damage in silicides of Pt, Pd, and NiJournal of Applied Physics, 1982
- Sheet resistivity and transmission electron microscope investigations of BF+2 -implanted siliconJournal of Applied Physics, 1981
- Refractory metal silicide formation induced by As+ implantationApplied Physics Letters, 1980
- Ion-beam-induced silicide formationApplied Physics Letters, 1979