Effects of chloride ion and applied current density on the stress generation during anodic oxidation of tungsten in 0.1 M H2SO4 solution
- 31 January 1996
- journal article
- Published by Elsevier in Electrochimica Acta
- Vol. 41 (1), 57-62
- https://doi.org/10.1016/0013-4686(95)00284-l
Abstract
No abstract availableKeywords
This publication has 11 references indexed in Scilit:
- Effects of applied current density and potential step on the stress generation during anodic oxidation of tungsten in 0.1 M H2SO4 solutionElectrochimica Acta, 1995
- Stresses produced by the anodic oxidation of nickelElectrochimica Acta, 1992
- Stress generation and vacancy annihilation during scale growth limited by cation-vacancy diffusionActa Metallurgica, 1988
- A Point Defect Model for Anodic Passive Films: I . Film Growth KineticsJournal of the Electrochemical Society, 1981
- Kinetics of Growth of Amorphous WO 3 Anodic Films on TungstenJournal of the Electrochemical Society, 1980
- The anodic oxidation of zirconium—II. Growth and morphology of anodic ZrO2 filmsElectrochimica Acta, 1977
- The anodic oxidation of zirconium—I. growth stresses in anodic ZrO2 filmsElectrochimica Acta, 1977
- Tensiostatic studies on formation and breakdown of anodic oxide films on tungsten in acidic chloride solutionsElectrochimica Acta, 1977
- The Kinetics of Anodic Oxidation of Iron in Neutral SolutionJournal of the Electrochemical Society, 1964
- Stresses in Anodic FilmsJournal of the Electrochemical Society, 1963