Mechanisms of reactive sputtering of indium III: A general phenomenological model for reactive sputtering
- 1 June 1980
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 69 (2), 229-235
- https://doi.org/10.1016/0040-6090(80)90039-5
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
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- The deposition rate of metallic thin films in the reactive sputtering processThin Solid Films, 1975
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