Formation of Rotationally Highly Excited NH (A3 IIi) Radical by VUV Laser at 193nm and Its Reactive Quenching by Foreign Gases
- 1 January 1982
- journal article
- Published by Laser Society of Japan in The Review of Laser Engineering
- Vol. 10 (4), 394-399
- https://doi.org/10.2184/lsj.10.394