Density and deposition rates of amorphous CVD-Si3N4 including carbon
- 1 October 1981
- journal article
- research article
- Published by Springer Science and Business Media LLC in Journal of Materials Science
- Vol. 16 (10), 2877-2882
- https://doi.org/10.1007/bf02402853
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
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- Synthesis, Characterization, and Consolidation of Si3N4 Obtained from Ammonolysis of SiCl4Journal of the American Ceramic Society, 1973
- The Preparation and Properties of Amorphous Silicon Nitride FilmsJournal of the Electrochemical Society, 1967
- Some interesting properties of pyrolytic carbonJournal of the Less Common Metals, 1959