Chemical vapor deposition in the systems silicon-carbon and silicon-carbon-nitrogen
- 30 September 1974
- journal article
- Published by Elsevier BV in Journal of the Less Common Metals
- Vol. 37 (3), 317-329
- https://doi.org/10.1016/0022-5088(74)90024-1
Abstract
No abstract availableKeywords
This publication has 9 references indexed in Scilit:
- Growth mechanism of polycrystalline β-SiC layers on silicon substrateApplied Physics Letters, 1972
- Gasphasenabscheidung im system TiSiCJournal of the Less Common Metals, 1972
- Gasphasenabscheidung im system Silicium-KohlenstoffJournal of the Less Common Metals, 1971
- Morphologie des gasphasenabgeschiedenen systems titancarbid-graphitJournal of the Less Common Metals, 1971
- Characterization of Silicon Nitride FilmsJournal of the Electrochemical Society, 1971
- β-Silicon Carbide FilmsJournal of the Electrochemical Society, 1969
- Thermodynamical Analyses and Experiments for the Preparation of Silicon NitrideJapanese Journal of Applied Physics, 1968
- Direct Nitridation of Silicon SubstratesJournal of the Electrochemical Society, 1968
- Epitaxial Growth of SiC Film on Silicon Substrate and Its Crystal StructureJapanese Journal of Applied Physics, 1966