Ion bombardment energy distributions in a radio frequency induction plasma
- 1 March 1993
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 62 (9), 940-942
- https://doi.org/10.1063/1.108526
Abstract
Ion bombardment energy distributions to a grounded substrate in a low pressure, rf induction plasma source are measured. The plasma source consists of a planar, spiral coil driven at 13.56 MHz which is separated from a low pressure discharge vessel by a quartz vacuum window. Ion bombardment spectra were determined using a differentially pumped retarding grid energy analyzer which samples the plasma through an 80 μm diam grounded, conducting orifice. The ion flux was found to be nearly monoenergetic for heavier ionic species such as Ar and oxygen. A double-peaked distribution was observed in water vapor plasmas where the sheath transit time of light ions is much less than the rf period. The average ion energy follows the average plasma potential and the width of the ion energy distribution correlates with the rf component of the floating probe potential, which is typically 2–6 Vp–p.Keywords
This publication has 14 references indexed in Scilit:
- Electromagnetic fields in a radio-frequency induction plasmaJournal of Vacuum Science & Technology A, 1993
- Review of inductively coupled plasmas for plasma processingPlasma Sources Science and Technology, 1992
- Analysis of a kinematic model for ion transport in rf plasma sheathsPhysical Review A, 1992
- The application of the helicon source to plasma processingJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1991
- Pressure and frequency dependence of ion bombardment energy distributions from rf dischargesJournal of Applied Physics, 1990
- Charged particle densities and energy distributions in a multipolar electron cyclotron resonant plasma etching sourceJournal of Vacuum Science & Technology A, 1990
- Application of a low-pressure radio frequency discharge source to polysilicon gate etchingJournal of Vacuum Science & Technology B, 1990
- Electron cyclotron resonance microwave discharges for etching and thin-film depositionJournal of Vacuum Science & Technology A, 1989
- Structured ion energy distribution in radio frequency glow-discharge systemsApplied Physics Letters, 1989
- Ion bombardment energy distributions in radio-frequency glow-discharge systemsJournal of Applied Physics, 1986