Abstract
Hexafluoroazomethane was decomposed photochemically and thermally in the presence of chloroform, of carbon tetrachloride and of mixtures of methyl chloride and carbon tetrachloride, in the vapour phase. Arrhenius parameters were measured for the reactions, CF3+CH3Cl→CF3H+CH2Cl CF3+CCl4→CF3Cl+CCl3 [graphic omitted] The results support those obtained previously using hexafluoroacetone as a source of CF3 radicals. Such discrepancies as are observed are probably caused by anomalies in the mechanism of the decomposition of hexafluorozomethane.