Radio frequency hollow cathodes for the plasma processing technology
- 1 December 1996
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 86-87, 648-656
- https://doi.org/10.1016/s0257-8972(96)03056-3
Abstract
No abstract availableThis publication has 38 references indexed in Scilit:
- Theoretical analysis of the electrode sheath in rf dischargesJournal of Applied Physics, 1989
- High rate jet plasma-assisted chemical vapour depositionThin Solid Films, 1988
- New way for high-rate a-Si depositionJournal of Non-Crystalline Solids, 1987
- Rf multipolar plasma for broad and reactive ion beamsVacuum, 1986
- High-rate hollow-cathode amorphous silicon depositionApplications of Surface Science, 1985
- Hollow Cathode Discharges - Analytical ApplicationsJournal of Research of the National Bureau of Standards, 1984
- Sustaining mechanisms in rf plasmasVacuum, 1984
- Hollow cathode reactive sputter etching—A new high-rate processApplied Physics Letters, 1983
- A critical review of spectral and related physical properties of the hollow cathode dischargeSpectrochimica Acta Part B: Atomic Spectroscopy, 1981
- The hollow-cathode effect and the theory of glow dischargesProceedings of the Royal Society of London. Series A. Mathematical and Physical Sciences, 1954