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Some Chemical Aspects of the Fluorocarbon Plasma Etching of Silicon and Its Compounds
Home
Publications
Some Chemical Aspects of the Fluorocarbon Plasma Etching of Silicon and Its Compounds
Some Chemical Aspects of the Fluorocarbon Plasma Etching of Silicon and Its Compounds
JC
J. W. Coburn
J. W. Coburn
EK
Eric Kay
Eric Kay
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1 January 1979
journal article
Published by
IBM
in
IBM Journal of Research and Development
Vol. 23
(1)
,
33-41
https://doi.org/10.1147/rd.231.0033
Abstract
No abstract available
Cited by 109 articles