FIELD-ENHANCED PHOTOEMISSION FROM LARGE-AREA Ge DIODES AT LOW TEMPERATURES
- 1 May 1967
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 10 (9), 249-251
- https://doi.org/10.1063/1.1754933
Abstract
Experimental observations on FEPE from large‐area Ge diodes at low temperatures (∼90°K) are reported. These data include values of the device quantum efficiency as a function of wavelength and bias. An effect is reported in which photon‐induced changes in emissive current are observed at wavelengths up to 2 μ, i.e. well beyond the absorption edge, with efficiencies 4 × 10−5. Aging characteristics associated with this long wavelength effect are described. A tentative suggestion is made that the effect is due to photon‐induced changes in the surface field leading to changes in field emission.Keywords
This publication has 3 references indexed in Scilit:
- Theory of the small-signal photovoltage at semiconductor surfacesSurface Science, 1967
- Field enhanced photoemission from large area silicon junctionsSolid-State Electronics, 1965
- Electron Emission from Avalanche Breakdown in SiliconPhysical Review B, 1957