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Surface hydrogen release during the growth of
a
‐Si:H by reactive magnetron sputtering
Home
Publications
Surface hydrogen release during the growth of
a
‐Si:H by reactive magnetron sputtering
Surface hydrogen release during the growth of
a
‐Si:H by reactive magnetron sputtering
J. R. Abelson
J. R. Abelson
JD
J. R. Doyle
J. R. Doyle
LM
L. Mandrell
L. Mandrell
AM
A. M. Myers
A. M. Myers
NM
N. Maley
N. Maley
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1 May 1990
journal article
Published by
American Vacuum Society
in
Journal of Vacuum Science & Technology A
Vol. 8
(3)
,
1364-1368
https://doi.org/10.1116/1.576883
Abstract
No abstract available
Cited by 13 articles