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Asymmetric bipolar pulsed DC: the enabling technology for reactive PVD
Home
Publications
Asymmetric bipolar pulsed DC: the enabling technology for reactive PVD
Asymmetric bipolar pulsed DC: the enabling technology for reactive PVD
JS
J. Sellers
J. Sellers
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31 January 1998
journal article
Published by
Elsevier
in
Surface and Coatings Technology
Vol. 98
(1-3)
,
1245-1250
https://doi.org/10.1016/s0257-8972(97)00403-9
Abstract
No abstract available
Cited by 122 articles