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Silicon Defect Structure Induced by Arsenic Diffusion and Subsequent Steam Oxidation
Home
Publications
Silicon Defect Structure Induced by Arsenic Diffusion and Subsequent Steam Oxidation
Silicon Defect Structure Induced by Arsenic Diffusion and Subsequent Steam Oxidation
SD
S. Dash
S. Dash
MJ
M. L. Joshi
M. L. Joshi
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1 July 1970
journal article
Published by
IBM
in
IBM Journal of Research and Development
Vol. 14
(4)
,
453-460
https://doi.org/10.1147/rd.144.0453
Abstract
No abstract available
Cited by 14 articles