Beam scanning-electrostatic
- 1 January 1979
- journal article
- research article
- Published by Taylor & Francis in Radiation Effects
- Vol. 44 (1), 71-80
- https://doi.org/10.1080/00337577908245981
Abstract
A discussion of electrostatic scanning systems is given with respect to mechanical scanning, uniformity and current capabilities as they relate to ion implanters. Equations for the degradation of uniformity due to wafer tilt. misalignment and changing beam size are presented. Some commercial implantation scanning systems and related data are also presented along with a proposed high current electrostatic scanning system.Keywords
This publication has 4 references indexed in Scilit:
- Space charge lens for high current ion beamsNuclear Instruments and Methods, 1978
- High current electrostatic deflector and scannerNuclear Instruments and Methods, 1976
- New imaging and deflection concept for probe-forming microfabrication systemsJournal of Vacuum Science and Technology, 1975
- Electron Beam Deflection: Part II. Applications of the Small-Angle Deflection TheoryJournal of Applied Physics, 1947