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Low-stress tantalum absorbers deposited by sputtering for x-ray masks
Home
Publications
Low-stress tantalum absorbers deposited by sputtering for x-ray masks
Low-stress tantalum absorbers deposited by sputtering for x-ray masks
YI
Yukio Iimura
Yukio Iimura
HM
Hiroyuki Miyashita
Hiroyuki Miyashita
HS
Hisatake Sano
Hisatake Sano
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1 November 1989
journal article
Published by
American Vacuum Society
in
Journal of Vacuum Science & Technology B
Vol. 7
(6)
,
1680-1683
https://doi.org/10.1116/1.584481
Abstract
No abstract available
Keywords
LOW STRESS
ABSORBERS DEPOSITED
RAY MASKS
SPUTTERING
STRESS TANTALUM ABSORBERS
Cited by 18 articles