B, C, N, and Ne ions of doses between 1015–1017 ions/cm2 were implanted to a depth of approximately 700 Å into polycrystalling Cu. The amount of oxygen incorporated during subsequent oxidation of the samples at 200 °C was determined from the interference color of the oxides and from nuclear microanalysis using the 16O(d,p)17O reaction.Implantation of B or Ne reduces the subsequent oxidation. On the other hand, C−implantation enhances the oxidation, except in the initial stages where a slight reduction is observed. Implantation of N ions is more complex; the resulting oxidation enhanced at low doses but is reduced at higher doses. The results are interpreted in terms of a combination of chemical and damage effects induced by the implanted ions.