Mass and energy dependence of the equilibrium surface composition of sputtered tantalum oxide
- 1 December 1978
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 33 (11), 950-952
- https://doi.org/10.1063/1.90230
Abstract
Anodically oxidized Ta2O5 surfaces were sputtered with 300–1800‐eV He+ and Ar+ ions. The surface composition was measured with AES and ISS. The results clearly show that the equilibrium surface composition depends on mass and energy of the primary ions. This composition is reversible for different masses or energies. A short discussion of these effects is given, including the characteristic fluence for obtaining equilibrium.Keywords
This publication has 13 references indexed in Scilit:
- On the problem of whether excited states amongst sputtered particles are of thermal originRadiation Effects, 1978
- A model for surface layer composition changes in sputtered alloys and compoundsApplied Physics Letters, 1977
- Theory of thermal sputteringRadiation Effects, 1977
- On the role of recoil implantation in altering the stoichiometry of a bombarded solidNuclear Instruments and Methods, 1976
- Threshold energies for sputteringNuclear Fusion, 1975
- Ion-impact chemistry in the system titanium-oxygen (studies on bombardment-enhanced conductivity—III)Journal of Physics and Chemistry of Solids, 1975
- X-ray photoelectron spectroscopic studies of nickel-oxygen surfaces using oxygen and argon ion-bombardmentSurface Science, 1974
- Techniques for elemental composition profiling in thin filmsC R C Critical Reviews in Solid State Sciences, 1973
- Alcohol, diet, and experimental hepatic injuryCanadian Journal of Physiology and Pharmacology, 1968
- Sputtering and depth-distribution phenomena in KCl, Al2O3, and TiO2Canadian Journal of Physics, 1968