Formation of amorphous layers in Al2O3 by ion implantation
- 1 March 1985
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 7-8, 473-478
- https://doi.org/10.1016/0168-583x(85)90415-x
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Near surface modification of α-Al2O3 by ion implantation followed by thermal annealingNuclear Instruments and Methods in Physics Research, 1983
- Ion implantation and thermal annealing of α-Al2O3 single crystalsJournal of Applied Physics, 1983