Electrical properties of non-stoichiometric tin oxide films obtained by the d.c. reactive sputtering method
- 1 April 1980
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 67 (1), 45-48
- https://doi.org/10.1016/0040-6090(80)90285-0
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Phase composition of SnOx thin films obtained by reactive d.c. sputteringThin Solid Films, 1979
- Transparent Conducting CoatingsAnnual Review of Materials Science, 1977
- The Preparation and Properties of Tin Oxide Films Formed by Oxidation of TetramethyltinJournal of the Electrochemical Society, 1976