Microdefect Elimination in Reduced Pressure Epitaxy on Silicon Wafer by Back Damage ‐ Si3 N 4 Film Technique
- 1 February 1981
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 128 (2), 395-399
- https://doi.org/10.1149/1.2127429