Application of pixe to the measurement of sputter deposits
- 15 January 1980
- journal article
- Published by Elsevier in Nuclear Instruments and Methods
- Vol. 168 (1-3), 411-414
- https://doi.org/10.1016/0029-554x(80)91285-9
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- The influence of surface structures on sputtering: Angular distribution and yield from faceted surfacesJournal of Materials Science, 1978
- Angular distributions of atoms sputtered from polycrystalline FCC- and BCC-metalsZeitschrift für Physik B Condensed Matter, 1977
- Angular distribution measurements of sputtered atoms with characteristic X-ray emissionNuclear Instruments and Methods, 1976
- Momentum deposition by heavy-ion bombardment and an application to sputteringJournal of Physics D: Applied Physics, 1975
- Theory of Sputtering. I. Sputtering Yield of Amorphous and Polycrystalline TargetsPhysical Review B, 1969