Sputtering of Single-Crystal Copper by 400 and 600 keV Argon Ions
- 1 September 1968
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 39 (10), 4849-4850
- https://doi.org/10.1063/1.1655852
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Evidence against Focused Chains in High-Yield Copper SputteringPhysical Review B, 1967
- Yield and angular distribution of cesium sputtered copper using a radioactive tracer technique.AIAA Journal, 1966
- Sputtering of Single-Crystal CopperJournal of Applied Physics, 1966
- Effect of Thin Carbonaceous Films on 500-keV Helium Ion Sputtering of CopperJournal of Applied Physics, 1965
- RANGE OF Xe133 AND Ar41 IONS OF KILOELECTRON VOLT ENERGIES IN ALUMINUMCanadian Journal of Physics, 1963