Ferroelectric thin films of PbTiO3on silicon
- 1 January 1999
- journal article
- review article
- Published by IOP Publishing in Journal of Physics D: Applied Physics
- Vol. 32 (1), R1-R18
- https://doi.org/10.1088/0022-3727/32/1/001
Abstract
The advantages offered by ferroelectric films deposited directly onto silicon in memory applications, field effect devices and pyroelectric detectors have stimulated intense research activity. This review covers work carried out during the last several years on their growth, characterization and device fabrication using ferroelectric thin films of on single-crystalline Si substrate with and without buffer layers.Keywords
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